The Mitutoyo M Plan Apo NUV and NUV HR objectives are engineered for precision imaging across the near-ultraviolet (NUV) to visible spectrum, offering magnifications from 10x to 100x. These lenses are fully apochromatically corrected for superior image flatness, chromatic correction, and contrast—making them ideal for high-resolution metrology, photolithography, and advanced microanalysis.
The standout 50x HR variant pushes performance further with increased numerical aperture and resolution, optimized for submicron imaging without compromising working distance. Across the entire range, these objectives feature long working distances and no cover glass requirement, providing flexibility and protection for delicate samples and instrumentation.
Built to meet the demands of semiconductor fabrication, cleanroom environments, and optical R&D, the M Plan Apo NUV series defines the standard for UV-corrected, long working distance microscopy.


Rotary Stage for Manual Micro/Macro 3D Imaging
Vertical Stand, 12x8 inches. Aluminum
L Plate for Mounting Specimens on Translational Stage
EOS M100 EF-M 15-45mm IS STM Kit (White)
Hatching Stick Insect
EOS-1D X Mark III Body Kit
