cleanroom objective lens

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Mitutoyo M Plan Apo NIR / NIR HR / NIR B Objectives (5x–100x) – High-Precision IR Imaging for Industrial and Research Applications — Price range: $2,020.00 through $11,300.00
Mitutoyo M Plan Apo NIR / NIR HR / NIR B Objectives (5x–100x) – High-Precision IR Imaging for Industrial and Research Applications

Mitutoyo’s M Plan Apo NIR, NIR HR, and NIR B objective lenses offer cutting-edge optical performance across the near-infrared (NIR) spectrum, with apochromatic correction extending from the visible into the NIR range. Available from 5x to 100x, these lenses provide long working distances, excellent contrast, and crisp resolution—perfect for backside silicon inspection, IR microscopy, and optoelectronics R&D.

NIR: Delivers robust NIR-VIS correction for standard infrared imaging tasks.

NIR HR: High-Resolution variant with improved NA and finer detail capture, suited for submicron analysis.

NIR B: Specially tuned for backside wafer inspection and imaging through IR-transparent materials.

These objectives are compatible with both transmitted and reflected light, with no cover glass requirement. Built for precision, they meet the high standards of cleanroom labs, semiconductor metrology, and optical component manufacturing.

Select options This product has multiple variants. The options may be chosen on the product page

Micro Kit-No Objectives — Price range: $2,020.00 through $11,300.00
Mitutoyo M Plan Apo NIR / NIR HR / NIR B Objectives (5x–100x) – High-Precision IR Imaging for Industrial and Research Applications

Mitutoyo’s M Plan Apo NIR, NIR HR, and NIR B objective lenses offer cutting-edge optical performance across the near-infrared (NIR) spectrum, with apochromatic correction extending from the visible into the NIR range. Available from 5x to 100x, these lenses provide long working distances, excellent contrast, and crisp resolution—perfect for backside silicon inspection, IR microscopy, and optoelectronics R&D.

NIR: Delivers robust NIR-VIS correction for standard infrared imaging tasks.

NIR HR: High-Resolution variant with improved NA and finer detail capture, suited for submicron analysis.

NIR B: Specially tuned for backside wafer inspection and imaging through IR-transparent materials.

These objectives are compatible with both transmitted and reflected light, with no cover glass requirement. Built for precision, they meet the high standards of cleanroom labs, semiconductor metrology, and optical component manufacturing.

Select options This product has multiple variants. The options may be chosen on the product page

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