Grid view List view
Mitutoyo M Plan UV Objectives (10x–80x) – Precision UV-Corrected Long Working Distance LensesMicro Kit-No Objectives
Select options This product has multiple variants. The options may be chosen on the product page

Mitutoyo M Plan UV Objectives (10x–80x) – Precision UV-Corrected Long Working Distance Lenses

$12,600.00 – $27,100.00

Mitutoyo’s M Plan UV series offers exceptional performance across the 10x to 80x range, delivering superior ultraviolet-corrected imaging for demanding applications. These long working distance objectives are ideal for semiconductor inspection, fluorescence microscopy, and photolithography, offering high numerical apertures and precise correction across the UV and visible spectra. Designed with no cover glass requirement and consistent parfocal lengths, they provide unmatched versatility and clarity in both research and industrial environments.

Whether you’re working in advanced materials science, optics, or microelectronics, the M Plan UV objectives provide crisp, high-contrast imaging—even in the near-UV range.

 

Mitutoyo M Plan Apo NUV & NUV HR Objectives (10x–100x) – High-Resolution UV Imaging Lenses with Extended Working DistanceMicro Kit-No Objectives
Select options This product has multiple variants. The options may be chosen on the product page

Mitutoyo M Plan Apo NUV & NUV HR Objectives (10x–100x) – High-Resolution UV Imaging Lenses with Extended Working Distance

$3,570.00 – $14,900.00

The Mitutoyo M Plan Apo NUV and NUV HR objectives are engineered for precision imaging across the near-ultraviolet (NUV) to visible spectrum, offering magnifications from 10x to 100x. These lenses are fully apochromatically corrected for superior image flatness, chromatic correction, and contrast—making them ideal for high-resolution metrology, photolithography, and advanced microanalysis.

The standout 50x HR variant pushes performance further with increased numerical aperture and resolution, optimized for submicron imaging without compromising working distance. Across the entire range, these objectives feature long working distances and no cover glass requirement, providing flexibility and protection for delicate samples and instrumentation.

Built to meet the demands of semiconductor fabrication, cleanroom environments, and optical R&D, the M Plan Apo NUV series defines the standard for UV-corrected, long working distance microscopy.