Mitutoyo M Plan UV Objectives (10x–80x) – Precision UV-Corrected Long Working Distance LensesMicro Kit-No Objectives
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Mitutoyo M Plan UV Objectives (10x–80x) – Precision UV-Corrected Long Working Distance Lenses

$12,600.00$27,100.00

Mitutoyo’s M Plan UV series offers exceptional performance across the 10x to 80x range, delivering superior ultraviolet-corrected imaging for demanding applications. These long working distance objectives are ideal for semiconductor inspection, fluorescence microscopy, and photolithography, offering high numerical apertures and precise correction across the UV and visible spectra. Designed with no cover glass requirement and consistent parfocal lengths, they provide unmatched versatility and clarity in both research and industrial environments.

Whether you’re working in advanced materials science, optics, or microelectronics, the M Plan UV objectives provide crisp, high-contrast imaging—even in the near-UV range.

 

Microscope HeadMicroscope Head
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Microscope Head

$6,940.00$16,100.00

Mitutoyo FX-70Microscopy that Meets the Moment

In research, nothing should stand between you and your data. The FX-70 gives you ample room to manipulate specimens, run experiments, and integrate instrumentation—all while maintaining elite optical performance.

If most microscopes are a tight glove, the FX-70 is an open workbench.  When your research demands both space and clarity, this scope delivers.

The Mitutoyo FX-70 microscope is renowned for its exceptional long working distance, providing significantly more clearance between the objective lens and the specimen compared to standard microscopes. To illustrate this advantage, here’s a comparison of working distances at various magnifications:​

Magnification Typical Microscope Working Distance Mitutoyo FX-70 Working Distance
~10 mm 34 mm
10× ~5 mm 34 mm
20× ~2 mm 20 mm
50× ~0.5 mm 20.5 mm

Note: These values are approximate and can vary depending on specific objective lenses used.

Metaphor for Perspective:

Imagine trying to read a book with your eyes just an inch away from the page—that’s akin to using a standard microscope with a short working distance. In contrast, the Mitutoyo FX-70 allows you to read that same book comfortably from across the table, maintaining perfect clarity. This extended working distance offers ample room for sample manipulation, integration of additional tools, and reduces the risk of contaminating or damaging sensitive specimens.

This substantial increase in working distance makes the Mitutoyo FX-70 particularly valuable in applications requiring precision and flexibility, such as semiconductor inspection, materials research, and quality control processes.

Need assistance, call 410-870-5566 and a representative will be available to help you. 

Mitutoyo M Plan Apo NUV & NUV HR Objectives (10x–100x) – High-Resolution UV Imaging Lenses with Extended Working DistanceMicro Kit-No Objectives
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Mitutoyo M Plan Apo NUV & NUV HR Objectives (10x–100x) – High-Resolution UV Imaging Lenses with Extended Working Distance

$3,570.00$14,900.00

The Mitutoyo M Plan Apo NUV and NUV HR objectives are engineered for precision imaging across the near-ultraviolet (NUV) to visible spectrum, offering magnifications from 10x to 100x. These lenses are fully apochromatically corrected for superior image flatness, chromatic correction, and contrast—making them ideal for high-resolution metrology, photolithography, and advanced microanalysis.

The standout 50x HR variant pushes performance further with increased numerical aperture and resolution, optimized for submicron imaging without compromising working distance. Across the entire range, these objectives feature long working distances and no cover glass requirement, providing flexibility and protection for delicate samples and instrumentation.

Built to meet the demands of semiconductor fabrication, cleanroom environments, and optical R&D, the M Plan Apo NUV series defines the standard for UV-corrected, long working distance microscopy.

Mitutoyo M Plan Apo NIR / NIR HR / NIR B Objectives (5x–100x) – High-Precision IR Imaging for Industrial and Research ApplicationsMicro Kit-No Objectives
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Mitutoyo M Plan Apo NIR / NIR HR / NIR B Objectives (5x–100x) – High-Precision IR Imaging for Industrial and Research Applications

$1,840.00$10,300.00

Mitutoyo’s M Plan Apo NIR, NIR HR, and NIR B objective lenses offer cutting-edge optical performance across the near-infrared (NIR) spectrum, with apochromatic correction extending from the visible into the NIR range. Available from 5x to 100x, these lenses provide long working distances, excellent contrast, and crisp resolution—perfect for backside silicon inspection, IR microscopy, and optoelectronics R&D.

  • NIR: Delivers robust NIR-VIS correction for standard infrared imaging tasks.

  • NIR HR: High-Resolution variant with improved NA and finer detail capture, suited for submicron analysis.

  • NIR B: Specially tuned for backside wafer inspection and imaging through IR-transparent materials.

These objectives are compatible with both transmitted and reflected light, with no cover glass requirement. Built for precision, they meet the high standards of cleanroom labs, semiconductor metrology, and optical component manufacturing.