Mitutoyo M Plan Apo NUV & NUV HR Objectives (10x–100x) – High-Resolution UV Imaging Lenses with Extended Working DistanceMicro Kit-No Objectives
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Mitutoyo M Plan Apo NUV & NUV HR Objectives (10x–100x) – High-Resolution UV Imaging Lenses with Extended Working Distance

$3,570.00$14,900.00

The Mitutoyo M Plan Apo NUV and NUV HR objectives are engineered for precision imaging across the near-ultraviolet (NUV) to visible spectrum, offering magnifications from 10x to 100x. These lenses are fully apochromatically corrected for superior image flatness, chromatic correction, and contrast—making them ideal for high-resolution metrology, photolithography, and advanced microanalysis.

The standout 50x HR variant pushes performance further with increased numerical aperture and resolution, optimized for submicron imaging without compromising working distance. Across the entire range, these objectives feature long working distances and no cover glass requirement, providing flexibility and protection for delicate samples and instrumentation.

Built to meet the demands of semiconductor fabrication, cleanroom environments, and optical R&D, the M Plan Apo NUV series defines the standard for UV-corrected, long working distance microscopy.

Mitutoyo M Plan Apo SLWD Objectives (20x, 50x, 100x) – Super Long Working Distance Optics for Brightfield PrecisionMicro Kit-No Objectives
Select options This product has multiple variants. The options may be chosen on the product page

Mitutoyo M Plan Apo SLWD Objectives (20x, 50x, 100x) – Super Long Working Distance Optics for Brightfield Precision

$3,570.00$5,510.00

The Mitutoyo M Plan Apo SLWD (Super Long Working Distance) objectives are built for precision imaging in brightfield reflected light applications where extra clearance is essential. Available in 20x, 50x, and 100x, these apochromatically corrected lenses deliver sharp, color-accurate images without sacrificing space between the objective and the sample.

With working distances as long as 30.5 mm at 20x and 6 mm at 100x, the SLWD series allows integration with probes, lighting systems, or other equipment beneath the objective—ideal for delicate samples, tall structures, or inline industrial inspection.

Optimized for cleanroom, R&D, and metrology environments, these objectives combine high numerical apertureperformance with the flexibility only super long working distance optics can provide.