Mitutoyo LCD Plan Apo NUV & NUV HR Objectives – Ultra-High Resolution, UV-Corrected Lenses (20x & 50x)Micro Kit-No Objectives
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Mitutoyo LCD Plan Apo NUV & NUV HR Objectives – Ultra-High Resolution, UV-Corrected Lenses (20x & 50x)

$7,280.00$17,900.00

The Mitutoyo LCD Plan Apo NUV and NUV HR objective lenses are engineered for next-generation near-ultraviolet imaging, delivering exceptional resolution and chromatic correction at 20x and 50x magnifications. The NUV HR 50xvariant further enhances resolution with a higher numerical aperture, making it ideal for sub-micron inspection tasks in advanced semiconductor and flat-panel display applications.

Designed with long working distances and compatibility across UV-VIS spectra, these objectives provide unparalleled precision for applications requiring maximum detail, minimal distortion, and compatibility with high-end optical systems.

Whether you’re aligning photomasks, inspecting OLED panels, or pushing the limits of microfabrication analysis, the NUV and NUV HR series offers the clarity and flexibility needed to meet the industry’s strictest standards.

Mitutoyo M Plan Apo NUV & NUV HR Objectives (10x–100x) – High-Resolution UV Imaging Lenses with Extended Working DistanceMicro Kit-No Objectives
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Mitutoyo M Plan Apo NUV & NUV HR Objectives (10x–100x) – High-Resolution UV Imaging Lenses with Extended Working Distance

$3,570.00$14,900.00

The Mitutoyo M Plan Apo NUV and NUV HR objectives are engineered for precision imaging across the near-ultraviolet (NUV) to visible spectrum, offering magnifications from 10x to 100x. These lenses are fully apochromatically corrected for superior image flatness, chromatic correction, and contrast—making them ideal for high-resolution metrology, photolithography, and advanced microanalysis.

The standout 50x HR variant pushes performance further with increased numerical aperture and resolution, optimized for submicron imaging without compromising working distance. Across the entire range, these objectives feature long working distances and no cover glass requirement, providing flexibility and protection for delicate samples and instrumentation.

Built to meet the demands of semiconductor fabrication, cleanroom environments, and optical R&D, the M Plan Apo NUV series defines the standard for UV-corrected, long working distance microscopy.

Mitutoyo M Plan Apo Brightfield Objectives (1x–100x) – Precision Long Working Distance Lenses for Reflected Light MicroscopyMicro Kit-No Objectives
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Mitutoyo M Plan Apo Brightfield Objectives (1x–100x) – Precision Long Working Distance Lenses for Reflected Light Microscopy

$748.00$9,350.00

The Mitutoyo M Plan Apo series for Brightfield Observation offers a complete range of long working distance, apochromatically corrected objectives from 1x to 100x. Designed for use in reflected light setups, these lenses deliver exceptional color fidelity, flatness, and sharpness across the field of view, making them ideal for surface inspection, materials science, industrial metrology, and microelectronics.

Each objective features no cover glass requirement, ensuring flexibility when imaging mounted, coated, or uneven samples. The high numerical apertures and long working distances support integration with lighting, automation, and precision inspection systems in cleanroom or lab environments.

From low-magnification overview to high-resolution detail, this series is the gold standard for brightfield microscopy in industrial and research settings.

Mitutoyo G Plan Apo Glass-Compensated Objectives (20x & 50x) – Optimized for 3.5 mm Thick Glass in Brightfield MicroscopyMicro Kit-No Objectives
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Mitutoyo G Plan Apo Glass-Compensated Objectives (20x & 50x) – Optimized for 3.5 mm Thick Glass in Brightfield Microscopy

$4,890.00$4,980.00

The Mitutoyo G Plan Apo series is specifically designed for brightfield reflected light microscopy through 3.5 mm thick glass, making it the perfect solution for imaging samples within microfluidic chambers, petri dishes, or sealed enclosures. These apochromatic objectives, available in 20x and 50x, are finely tuned to compensate for the refractive and optical effects of thick glass, ensuring crisp, high-resolution imaging without aberration.

With long working distances and full color correction across the visible spectrum, these objectives provide an edge in biological, industrial, and precision engineering applications where imaging through transparent barriers is essential. They’re ideal for in situ monitoring, encapsulated sample analysis, and controlled-environment research.

Mitutoyo BD Plan Apo Objectives (2x–100x) – Apochromatic Long WD Optics for Brightfield & Darkfield MicroscopyMicro Kit-No Objectives
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Mitutoyo BD Plan Apo Objectives (2x–100x) – Apochromatic Long WD Optics for Brightfield & Darkfield Microscopy

$1,040.00$4,410.00

The Mitutoyo BD Plan Apo series is engineered for both brightfield and darkfield reflected light microscopy, offering exceptional apochromatic correction and ultra-flat field imaging from 2x to 100x magnification. These objectives are ideal for applications that require enhanced edge contrast and surface detail—such as semiconductor inspection, MEMS analysis, and materials science.

With long working distances, no cover glass requirement, and built-in BD illumination support, these objectives provide unmatched flexibility and clarity across both lighting modes. Whether you’re visualizing micro-scratches, profiling polished surfaces, or inspecting layered structures, the BD Plan Apo line ensures consistent, high-resolution results.