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Mitutoyo LCD Plan Apo NUV & NUV HR Objectives – Ultra-High Resolution, UV-Corrected Lenses (20x & 50x)Micro Kit-No Objectives
Select options This product has multiple variants. The options may be chosen on the product page

Mitutoyo LCD Plan Apo NUV & NUV HR Objectives – Ultra-High Resolution, UV-Corrected Lenses (20x & 50x)

$7,280.00 – $17,900.00

The Mitutoyo LCD Plan Apo NUV and NUV HR objective lenses are engineered for next-generation near-ultraviolet imaging, delivering exceptional resolution and chromatic correction at 20x and 50x magnifications. The NUV HR 50xvariant further enhances resolution with a higher numerical aperture, making it ideal for sub-micron inspection tasks in advanced semiconductor and flat-panel display applications.

Designed with long working distances and compatibility across UV-VIS spectra, these objectives provide unparalleled precision for applications requiring maximum detail, minimal distortion, and compatibility with high-end optical systems.

Whether you’re aligning photomasks, inspecting OLED panels, or pushing the limits of microfabrication analysis, the NUV and NUV HR series offers the clarity and flexibility needed to meet the industry’s strictest standards.

Mitutoyo M Plan Apo NUV & NUV HR Objectives (10x–100x) – High-Resolution UV Imaging Lenses with Extended Working DistanceMicro Kit-No Objectives
Select options This product has multiple variants. The options may be chosen on the product page

Mitutoyo M Plan Apo NUV & NUV HR Objectives (10x–100x) – High-Resolution UV Imaging Lenses with Extended Working Distance

$3,570.00 – $14,900.00

The Mitutoyo M Plan Apo NUV and NUV HR objectives are engineered for precision imaging across the near-ultraviolet (NUV) to visible spectrum, offering magnifications from 10x to 100x. These lenses are fully apochromatically corrected for superior image flatness, chromatic correction, and contrast—making them ideal for high-resolution metrology, photolithography, and advanced microanalysis.

The standout 50x HR variant pushes performance further with increased numerical aperture and resolution, optimized for submicron imaging without compromising working distance. Across the entire range, these objectives feature long working distances and no cover glass requirement, providing flexibility and protection for delicate samples and instrumentation.

Built to meet the demands of semiconductor fabrication, cleanroom environments, and optical R&D, the M Plan Apo NUV series defines the standard for UV-corrected, long working distance microscopy.