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Mitutoyo LCD Plan Apo NIR & NIR HR Objectives (20x–100x) – Infrared-Optimized, Long Working Distance OpticsMicro Kit-No Objectives
Select options This product has multiple variants. The options may be chosen on the product page

Mitutoyo LCD Plan Apo NIR & NIR HR Objectives (20x–100x) – Infrared-Optimized, Long Working Distance Optics

$4,520.00 – $16,400.00

The Mitutoyo LCD Plan Apo NIR and NIR HR series deliver outstanding performance across the near-infrared (NIR) spectrum, optimized for inspection, metrology, and failure analysis in silicon, MEMS, and other IR-transparent materials. Covering magnifications from 20x to 100x, these objectives provide high numerical apertures, long working distances, and minimal aberration—making them ideal for laser-based alignment, backside wafer inspection, and biological IR imaging.

The HR (High Resolution) variants push the limits of clarity and detail, especially at 50x and 100x, offering sharper, more contrast-rich imaging while maintaining infrared compatibility. Whether you’re working with IR lasers, spectroscopy setups, or NIR fluorescence, this series ensures precision and flexibility at every magnification.

Mitutoyo M Plan Apo NIR / NIR HR / NIR B Objectives (5x–100x) – High-Precision IR Imaging for Industrial and Research ApplicationsMicro Kit-No Objectives
Select options This product has multiple variants. The options may be chosen on the product page

Mitutoyo M Plan Apo NIR / NIR HR / NIR B Objectives (5x–100x) – High-Precision IR Imaging for Industrial and Research Applications

$1,840.00 – $10,300.00

Mitutoyo’s M Plan Apo NIR, NIR HR, and NIR B objective lenses offer cutting-edge optical performance across the near-infrared (NIR) spectrum, with apochromatic correction extending from the visible into the NIR range. Available from 5x to 100x, these lenses provide long working distances, excellent contrast, and crisp resolution—perfect for backside silicon inspection, IR microscopy, and optoelectronics R&D.

  • NIR: Delivers robust NIR-VIS correction for standard infrared imaging tasks.

  • NIR HR: High-Resolution variant with improved NA and finer detail capture, suited for submicron analysis.

  • NIR B: Specially tuned for backside wafer inspection and imaging through IR-transparent materials.

These objectives are compatible with both transmitted and reflected light, with no cover glass requirement. Built for precision, they meet the high standards of cleanroom labs, semiconductor metrology, and optical component manufacturing.