Mitutoyo infinity corrected microscope objective lenses have set the standard of excellence for long working distance microscope optics. Our objectives implement an innovative approach and plan-apochromat lenses that provide long working distance capabilities. Optimized for brightfield illumination, these objective lenses are ideal for in-line illumination applications.

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Mitutoyo M Plan UV Objectives (10x–80x) – Precision UV-Corrected Long Working Distance Lenses

$12,600.00 – $27,100.00

Mitutoyo’s M Plan UV series offers exceptional performance across the 10x to 80x range, delivering superior ultraviolet-corrected imaging for demanding applications. These long working distance objectives are ideal for semiconductor inspection, fluorescence microscopy, and photolithography, offering high numerical apertures and precise correction across the UV and visible spectra. Designed with no cover glass requirement and consistent parfocal lengths, they provide unmatched versatility and clarity in both research and industrial environments.

Whether you’re working in advanced materials science, optics, or microelectronics, the M Plan UV objectives provide crisp, high-contrast imaging—even in the near-UV range.

 

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Mitutoyo LCD Plan UV Objectives (20x & 50x) – UV-Corrected, Long WD Lenses for Display & Semiconductor Inspection

$19,400.00 – $19,900.00

The Mitutoyo LCD Plan UV series delivers high-performance ultraviolet-corrected optics tailored for display inspection, lithography alignment, and semiconductor manufacturing. Available in 20x and 50x magnifications, these objectives combine long working distances with excellent correction in the UV and visible ranges. Engineered for demanding imaging tasks on flat-panel displays and substrates, they offer outstanding edge-to-edge sharpness and minimal chromatic aberration.

These objectives are optimized for use with transmitted and reflected light setups, ensuring versatility in both R&D and high-throughput industrial environments. Ideal for cleanroom integration and precise inspection workflows.

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Mitutoyo LCD Plan Apo NUV & NUV HR Objectives – Ultra-High Resolution, UV-Corrected Lenses (20x & 50x)

$7,280.00 – $17,900.00

The Mitutoyo LCD Plan Apo NUV and NUV HR objective lenses are engineered for next-generation near-ultraviolet imaging, delivering exceptional resolution and chromatic correction at 20x and 50x magnifications. The NUV HR 50xvariant further enhances resolution with a higher numerical aperture, making it ideal for sub-micron inspection tasks in advanced semiconductor and flat-panel display applications.

Designed with long working distances and compatibility across UV-VIS spectra, these objectives provide unparalleled precision for applications requiring maximum detail, minimal distortion, and compatibility with high-end optical systems.

Whether you’re aligning photomasks, inspecting OLED panels, or pushing the limits of microfabrication analysis, the NUV and NUV HR series offers the clarity and flexibility needed to meet the industry’s strictest standards.

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Mitutoyo LCD Plan Apo NIR & NIR HR Objectives (20x–100x) – Infrared-Optimized, Long Working Distance Optics

$4,520.00 – $16,400.00

The Mitutoyo LCD Plan Apo NIR and NIR HR series deliver outstanding performance across the near-infrared (NIR) spectrum, optimized for inspection, metrology, and failure analysis in silicon, MEMS, and other IR-transparent materials. Covering magnifications from 20x to 100x, these objectives provide high numerical apertures, long working distances, and minimal aberration—making them ideal for laser-based alignment, backside wafer inspection, and biological IR imaging.

The HR (High Resolution) variants push the limits of clarity and detail, especially at 50x and 100x, offering sharper, more contrast-rich imaging while maintaining infrared compatibility. Whether you’re working with IR lasers, spectroscopy setups, or NIR fluorescence, this series ensures precision and flexibility at every magnification.

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Mitutoyo M Plan Apo NUV & NUV HR Objectives (10x–100x) – High-Resolution UV Imaging Lenses with Extended Working Distance

$3,570.00 – $14,900.00

The Mitutoyo M Plan Apo NUV and NUV HR objectives are engineered for precision imaging across the near-ultraviolet (NUV) to visible spectrum, offering magnifications from 10x to 100x. These lenses are fully apochromatically corrected for superior image flatness, chromatic correction, and contrast—making them ideal for high-resolution metrology, photolithography, and advanced microanalysis.

The standout 50x HR variant pushes performance further with increased numerical aperture and resolution, optimized for submicron imaging without compromising working distance. Across the entire range, these objectives feature long working distances and no cover glass requirement, providing flexibility and protection for delicate samples and instrumentation.

Built to meet the demands of semiconductor fabrication, cleanroom environments, and optical R&D, the M Plan Apo NUV series defines the standard for UV-corrected, long working distance microscopy.

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Mitutoyo M Plan Apo NIR / NIR HR / NIR B Objectives (5x–100x) – High-Precision IR Imaging for Industrial and Research Applications

$1,840.00 – $10,300.00

Mitutoyo’s M Plan Apo NIR, NIR HR, and NIR B objective lenses offer cutting-edge optical performance across the near-infrared (NIR) spectrum, with apochromatic correction extending from the visible into the NIR range. Available from 5x to 100x, these lenses provide long working distances, excellent contrast, and crisp resolution—perfect for backside silicon inspection, IR microscopy, and optoelectronics R&D.

  • NIR: Delivers robust NIR-VIS correction for standard infrared imaging tasks.

  • NIR HR: High-Resolution variant with improved NA and finer detail capture, suited for submicron analysis.

  • NIR B: Specially tuned for backside wafer inspection and imaging through IR-transparent materials.

These objectives are compatible with both transmitted and reflected light, with no cover glass requirement. Built for precision, they meet the high standards of cleanroom labs, semiconductor metrology, and optical component manufacturing.

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Mitutoyo M Plan Apo Brightfield Objectives (1x–100x) – Precision Long Working Distance Lenses for Reflected Light Microscopy

$748.00 – $9,350.00

The Mitutoyo M Plan Apo series for Brightfield Observation offers a complete range of long working distance, apochromatically corrected objectives from 1x to 100x. Designed for use in reflected light setups, these lenses deliver exceptional color fidelity, flatness, and sharpness across the field of view, making them ideal for surface inspection, materials science, industrial metrology, and microelectronics.

Each objective features no cover glass requirement, ensuring flexibility when imaging mounted, coated, or uneven samples. The high numerical apertures and long working distances support integration with lighting, automation, and precision inspection systems in cleanroom or lab environments.

From low-magnification overview to high-resolution detail, this series is the gold standard for brightfield microscopy in industrial and research settings.

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Mitutoyo M Plan Apo SLWD Objectives (20x, 50x, 100x) – Super Long Working Distance Optics for Brightfield Precision

$3,570.00 – $5,510.00

The Mitutoyo M Plan Apo SLWD (Super Long Working Distance) objectives are built for precision imaging in brightfield reflected light applications where extra clearance is essential. Available in 20x, 50x, and 100x, these apochromatically corrected lenses deliver sharp, color-accurate images without sacrificing space between the objective and the sample.

With working distances as long as 30.5 mm at 20x and 6 mm at 100x, the SLWD series allows integration with probes, lighting systems, or other equipment beneath the objective—ideal for delicate samples, tall structures, or inline industrial inspection.

Optimized for cleanroom, R&D, and metrology environments, these objectives combine high numerical apertureperformance with the flexibility only super long working distance optics can provide.

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Mitutoyo G Plan Apo Glass-Compensated Objectives (20x & 50x) – Optimized for 3.5 mm Thick Glass in Brightfield Microscopy

$4,890.00 – $4,980.00

The Mitutoyo G Plan Apo series is specifically designed for brightfield reflected light microscopy through 3.5 mm thick glass, making it the perfect solution for imaging samples within microfluidic chambers, petri dishes, or sealed enclosures. These apochromatic objectives, available in 20x and 50x, are finely tuned to compensate for the refractive and optical effects of thick glass, ensuring crisp, high-resolution imaging without aberration.

With long working distances and full color correction across the visible spectrum, these objectives provide an edge in biological, industrial, and precision engineering applications where imaging through transparent barriers is essential. They’re ideal for in situ monitoring, encapsulated sample analysis, and controlled-environment research.

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Mitutoyo BD Plan Apo Objectives (2x–100x) – Apochromatic Long WD Optics for Brightfield & Darkfield Microscopy

$1,040.00 – $4,410.00

The Mitutoyo BD Plan Apo series is engineered for both brightfield and darkfield reflected light microscopy, offering exceptional apochromatic correction and ultra-flat field imaging from 2x to 100x magnification. These objectives are ideal for applications that require enhanced edge contrast and surface detail—such as semiconductor inspection, MEMS analysis, and materials science.

With long working distances, no cover glass requirement, and built-in BD illumination support, these objectives provide unmatched flexibility and clarity across both lighting modes. Whether you’re visualizing micro-scratches, profiling polished surfaces, or inspecting layered structures, the BD Plan Apo line ensures consistent, high-resolution results.

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